Varianten der Berechnung des polychromatischen Speckle-Kontrastes für Gausssche Oberflächenstatistik = Variantes de calcul du contraste du speckle polychromatique en statistique de surface gaussienne = Variants of calculation of polychromatic speckle contrast in gaussian surface statisticsARNZ, M.Experimentelle Technik der Physik. 1985, Vol 33, Num 2, pp 107-122, issn 0014-4924Article

Electric field generation in hollow dielectric waveguide lasers. II : First-order perturbation theory in the presence of waveguide imperfections due to rough boundariesARNZ, M; PONATH, H.-E.Journal of the Optical Society of America. B, Optical physics (Print). 1988, Vol 5, Num 7, pp 1438-1447, issn 0740-3224Article

Roughness-induced scattering and attenuation of guided modes in slab waveguidesARNZ, M; PONATH, H.-E.Journal of the Optical Society of America. A, Optics and image science. 1986, Vol 3, Num 12, pp 2055-2068, issn 0740-3232Article

Electric field generation in hollow dielectric waveguide lasers. I: General theory of unperturbed symmetric waveguide configurationARNZ, M; PONATH, H.-E.Journal of the Optical Society of America. B, Optical physics (Print). 1988, Vol 5, Num 7, pp 1424-1437, issn 0740-3224Article

Streuung elektromagnetischer Wellen an rauhen Oberflächen mit anisotropen Autokorrelationsfunktion = Scattering of electromagnetic bulk waves from rough surfaces with anisotropic autocorrelation functionARNZ, M; PONATH, H.-E.Annalen der Physik (Leipzig). 1987, Vol 44, Num 7, pp 493-502, issn 0003-3804Article

The impact of aberration averaging during step-and-scan on the photolithographic processERDMANN, A; ARNZ, M.Microelectronic engineering. 1998, Vol 41-42, pp 117-120, issn 0167-9317Conference Paper

High-resolution and high-precision pattern placement metrology for the 45 nm node and beyondKLOSE, G; BUTTGEREIT, U; ARNZ, M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 67920M.1-67920M.6, issn 0277-786X, isbn 978-0-8194-6956-4Conference Paper

Correlation method based mask to mask overlay metrology for 32nm node and beyondSEIDEL, D; ARNZ, M; BEYER, D et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7985, issn 0277-786X, isbn 978-0-8194-8553-3, 79850E.1-79850E.13Conference Paper

Improving registration metrology by correlation methods based on alias-free image simulationSEIDEL, D; ARNZ, M; BEYER, D et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 78232N.1-78232N.9, 2Conference Paper

Monte-Carlo Simulations of Image Analysis for flexible and high-resolution Registration MetrologyARNZ, M; KLOSE, G; TROLL, G et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700L.1-74700L.7Conference Paper

Calibration of test masks used for lithography lens systemsARNZ, M; HÄSSLER-GROHNE, W; BODERMANN, B et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62810C.1-62810C.12, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

Calibration of test reticles for qualification of imaging properties of microlithographic projection lensesHÄSSLER-GROHNE, W; HAHM, K; MIRANDE, W et al.SPIE proceedings series. 2002, pp 142-150, isbn 0-8194-4531-2, 9 p.Conference Paper

Lithographic process simulation for scannersERDMANN, A; ARNZ, M; MAENHOUDT, M et al.SPIE proceedings series. 1998, pp 164-175, isbn 0-8194-2779-9Conference Paper

PROVE<^TM> a Photomask Registration and Overlay Metrology System for the 45 nm node and beyondKLOSE, G; BEYER, D; ARNZ, M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702832.1-702832.6, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Overlay mapping of microlithographic pattern generators by means of grouped structuresARNZ, M; HEPPNER, J; LESSLE, W et al.SPIE proceedings series. 1999, pp 106-112, isbn 0-8194-3139-7Conference Paper